Benefits
SCRAP PREVENTION
Predict equipment failures to eliminate costly wafer scrap or rework by no longer running to fail.
PREDICTIVE MAINTENANCE
Make run to fail maintenance practices a thing of the past by implementing condition based monitoring of your equipment. Empower your maintenance personnel to proactively take action prior to a catastrophic equipment failure to avoid costly downtime and repairs.
MEAN TIME TO REPAIR (MTTR)
Utilize failure analysis and classification to quickly diagnose the root cause of equipment and process issues to return your equipment back into production faster than ever before.
COST OF OWNERSHIP (COO)
Optimize your maintenance schedules to reduce costs associated with unnecessary maintenance activities. Exchange parts and consumables based on their actual condition rather than relying on antiquated and costly preventive maintenance practices.
EQUIPMENT UPTIME
Improve equipment uptime using a combination of proactive maintenance strategies, such as predictive maintenance and equipment maintenance schedule optimization helps ensure that all maintenance activities are performed at the most opportune times to minimize downtime. Enhance your existing equipment with more advanced control technologies to eliminate periodic control system maintenance required by antiquated control systems.
PROCESS CAPABILITY
Enhance equipment controller capabilities to achieve tighter process specifications without buying new equipment.
WAFER THROUGHPUT
More precise control of critical control variables reduces stabilization phases of your process allowing you to push more wafers through your equipment.
DEVICE YIELD
Utilize equipment controller enhancements and run-to-run process control systems to improve manufacturing quality and increase device yield.
TURN KEY SOLUTION
Our products are not do-it-yourself tool kits or projects. Immediately benefit from our extensive domain knowledge and experience in semiconductor manufacturing to solve any problem you might be facing.
SECS/GEM
EDA-INTERFACE A
SECS/GEM
SEMI Equipment Communications Standard (SECS) and Generic Equipment Model (GEM) are protocols utilized for equipment-to-host data communications in the semiconductor industry.
REST-API
EDA-INTERFACE A
SECS/GEM
Representational State Transfer Application Programming Interface (REST API) is a widely used communication interface for web-based software applications. It allows different software applications to communicate with each other by exchanging data over a standard protocol, enabling fast and efficient software development and integration.
EDA-INTERFACE A
EDA-INTERFACE A
EDA-INTERFACE A
SEMI Standard Equipment Data Acquisition (EDA) Interface-A is a data acquisition protocol utilized in the semiconductor industry. It is a self-defining data subscription protocol providing one-way communication to any software application.
FRONT END MANUFACTURING APPLICATIONS
DIFFUSION HEATING ELEMENTS
DIFFUSION HEATING ELEMENTS
DIFFUSION HEATING ELEMENTS
Resistance monitoring to prevent wafer scrap and equipment downtime. Model Based Temperature Control (MBTC) retrofits to improve process capability and eliminate real-time and offline profiling. Heating Element Life Optimization (HELO) controllers increase element lifetime.
BOAT LOADERS AND ELEVATORS
DIFFUSION HEATING ELEMENTS
DIFFUSION HEATING ELEMENTS
Vibration monitoring of linear actuators and drives to predict mechanical failure, particle contamination, and wafer load/unload errors.
DRY VACUUM PUMPS
DIFFUSION HEATING ELEMENTS
CHEMICAL MECHANICAL POLISHING
Vibration monitoring to detect mechanical wear and failure of motors, gearbox, lobes, screws, and casings to prevent wafer scrap, minimize rebuild costs, and validate incoming rebuild quality.
CHEMICAL MECHANICAL POLISHING
CHEMICAL MECHANICAL POLISHING
CHEMICAL MECHANICAL POLISHING
Vibration monitoring of polishing heads, platens, and pad conditioning arms to monitor mechanical wear and failure as well as detect wafer scratching and breakage. Real-time pad conditioner downforce monitoring to improve polishing repeatability.
BOAT ROTATION UNITS
CHEMICAL MECHANICAL POLISHING
BOAT ROTATION UNITS
Vibration monitoring of ferrofluid seal, motor and mechanical linkage to prevent particle contamination and wafer scrap
DC POWER SUPPLIES
CHEMICAL MECHANICAL POLISHING
BOAT ROTATION UNITS
Voltage monitoring and redundancy protection for power supplies to reduce scrap and downtime as well as improve your mean time to repair.
CABINET EHXAUST
BAROMETRIC PRESSURE
CABINET EHXAUST
Current or vibration monitoring of bearings and motors of the exhaust fans to prevent electronic component overheating and failure.
LEAKS
BAROMETRIC PRESSURE
CABINET EHXAUST
Detect water and chemical leaks underneath equipment before it becomes a safety hazard or damages your equipment.
BAROMETRIC PRESSURE
BAROMETRIC PRESSURE
BAROMETRIC PRESSURE
Automated adjustment of process recipe parameters in atmospheric processes to compensate for barometric pressure disturbances improving process run-to-run repeatability.
EXHAUST LINES
HEATER BLOCKS AND PEDESTALS
EXHAUST LINES
Pressure monitoring of exhaust draw to detect clogging in the lines or abatement system to prevent wafer scrap and equipment downtime
HALOGEN LAMPS
HEATER BLOCKS AND PEDESTALS
EXHAUST LINES
Resistance and light intensity monitoring to process uniformity variation and wafer scrap.
HEATER BLOCKS AND PEDESTALS
HEATER BLOCKS AND PEDESTALS
HEATER BLOCKS AND PEDESTALS
Resistance monitoring to prevent wafer scrap and reduce equipment downtime
IMMERSION HEATERS
MASS FLOW CONTROLLERS
HEATER BLOCKS AND PEDESTALS
Resistance monitoring to prevent wafer scrap and reduce equipment downtime
MASS FLOW CONTROLLERS
MASS FLOW CONTROLLERS
MASS FLOW CONTROLLERS
Gas flow monitoring to ensure MFC integrity to reduce wafer scrap and process drift
PNEUMATIC PUMPS
MASS FLOW CONTROLLERS
MASS FLOW CONTROLLERS
Vibration based stroke monitoring of diaphragm and bellows pumps detects filter clogging and mechanical failure. Real-time pneumatic pressure measurement detects air leaks in pneumatic tubing, shuttle valves, manifolds, and compression fittings.
TURBO PUMPS
WAFER SCRATCHING AND BREAKAGE
WAFER HANDLING ROBOTS
Vibration monitoring to prevent wafer scrap and process tool damage as well as reduce rebuild costs
WAFER HANDLING ROBOTS
WAFER SCRATCHING AND BREAKAGE
WAFER HANDLING ROBOTS
Vibration monitoring to detect component degradation and calibration drift of the robot to prevent wafer scrap and equipment downtime
WAFER SCRATCHING AND BREAKAGE
WAFER SCRATCHING AND BREAKAGE
WAFER SCRATCHING AND BREAKAGE
Vibration monitoring to detect misalignment of the automation resulting in wafer scratching or breakage
FACILITIES APPLICATIONS
WATER CHILLERS
AIR COMPRESSORS
AIR COMPRESSORS
Vibration monitoring of compressors, chilled water pumps, and condenser water pumps to predict mechanical wear and failure of motors, gears, bearings, and impellers. In situ monitoring of water quality, temperature, pressure, flow, and leaks as well as refrigerant charge and leaks.
AIR COMPRESSORS
AIR COMPRESSORS
AIR COMPRESSORS
Vibration monitoring to predict mechanical wear and failure of motors, gears, bearings, and other surfaces. In situ monitoring of oil quality, temperature, and pressure.
CENTRAL VACUUM
AIR COMPRESSORS
CENTRAL VACUUM
Vibration monitoring to detect mechanical wear and failure of motors, gearbox, lobes, screws, and casings. In situ monitoring of oil quality, temperature, and pressure.
PUMPS
CLEANROOM HVAC
CENTRAL VACUUM
Vibration monitoring of water pumps (chilled, condenser, deionized, and reverse osmosis) as well as chemical pumps to predict mechanical wear and failure of motors, bearings, couplings, and impellers. In situ monitoring of media quality, temperature, pressure, flow, and leaks.
ABATEMENT
CLEANROOM HVAC
CLEANROOM HVAC
Vibration monitoring of water pumps and air handlers to predict mechanical wear and failure of motors, gears, bearings, couplings, and impellers. In situ monitoring of temperature, pressure, flow, and leaks.
CLEANROOM HVAC
CLEANROOM HVAC
CLEANROOM HVAC
Vibration monitoring of air handlers, chillers, cooling towers, and water pumps to detect mechanical wear and failure. HEPA filter differential pressure monitoring for condition based exchange. Resistance monitoring of electric heaters to predict failures. Localized air quality monitoring for particle source detection.
PIPE LEAKS
PIPE LEAKS
PIPE LEAKS
Detect water and chemical leaks along pipes before it becomes a safety hazard or damages your facility.
CUSTOMERS
